- 品名： 貝意克小型回轉(zhuǎn)PECVD系統(tǒng)
- 型號(hào)： BTF-1200C-R-S-PECVD
- 產(chǎn)品詳情
- 規(guī)格參數(shù)
主要特點(diǎn)Main features
該設(shè)備爐管可360度旋轉(zhuǎn)，管內(nèi)壁有石英擋片幫助粉料翻轉(zhuǎn)有助于燒結(jié)得更均勻;
The tube of the equipment can be rotated 360 degrees, and the quartz baffle on the inner wall of the tube helps the powder to be turned over to help the sintering to be more uniform;
可左右大角度傾斜，方便出放料，傾斜角度在0~35°之間;
It can be tilted from left to right at a large angle to facilitate the discharge. The tilt angle is between 0~35°.
該款設(shè)備是全自動(dòng)Plasma增強(qiáng)CVD系統(tǒng)(PECVD)，連續(xù)可控溫度以及Plasma強(qiáng)度等，配備真空系統(tǒng)，可以實(shí)現(xiàn)低壓條件下的實(shí)驗(yàn)，針對(duì)低溫石墨烯、碳納米管生長(zhǎng)等。PECVD系統(tǒng)能使整個(gè)實(shí)驗(yàn)腔體都處于輝光產(chǎn)生區(qū)，輝光均勻等效，這種技術(shù)很好的解決了傳統(tǒng)等離子工作不穩(wěn)定狀態(tài)，這樣離子化的范圍和強(qiáng)度是傳統(tǒng)PECVD的百倍，并解決了物料不均勻堆積現(xiàn)象;
The device is a fully automated Plasma Enhanced CVD System (PECVD),can achieve continuous sliding temperature zones and to continuously control the temperature and plasma intensity.Equipped with vacuum unit,can realize experiments under low pressure conditions, such as low temperature graphene and carbon nanotube growth. PECVD system enables the entire experimental cavity to be in the glow generation area, and the glow is evenly equivalent. This technique solves the unstable state of the traditional plasma operation, so the range and intensity of ionization. It is a hundred times more than traditional PECVD and solves the problem of uneven material accumulation.
本款設(shè)備可以做金屬?gòu)?fù)合石墨烯材料，是目前**端的金屬?gòu)?fù)合材料制備設(shè)備。
Used for prepare metal composite graphene material,is the most high-end preparation equipment for metal composite material
技術(shù)參數(shù)Technical Parameters
Furnace加熱爐 | |
Max. Temp | 1100℃ |
Temperature Controller 控溫方式 | lPID automatic control and auto-tune function. 模糊PID控制和自整定調(diào)節(jié) l30 programmable segments for precise thermal processing. 智能化30段可編程控制 lBuilt-in protection for the over-heated and broken thermocouple. 超溫和斷偶報(bào)警功能 l10" LCD touch screen and industrial instrumentation dual temperature control 10"液晶觸屏與工控儀表雙重控溫 |
Heating Elements 加熱元件 | ·Resistance wire, Fe-Cr-Al Alloy doped by Mo 電阻絲（摻鉬鐵鉻鋁合金） |
Temperature Accuracy 控溫精度 | +/- 1℃ |
Processing tube 爐管 | ·Size：Φ25*800（middle sizeΦ50*225） 尺寸：Φ25*800（中間部位尺寸Φ50*225） Furnace tube rotation rate：3~13r/min 爐管轉(zhuǎn)速：3~13r/min |
Furnace body inclination angle | 0~35°（adjustable） |
PE source PE源 | |
Signal frequency信號(hào)頻率 | 13.56 MHz±0.005% |
Power output range功率輸出范圍 | 0-150W |
RF output interface射頻輸出接口 | 50 Ω, N-type, female |
Power stability功率穩(wěn)定性 | ≤5W |
Gas supply system氣路系統(tǒng) | |
High precision mass Flowmeter（Range optional） | 高精度質(zhì)量流量計(jì)（量程可選） |
Accuracy準(zhǔn)確度 | ±1.5% |
Response accuracy響應(yīng)精度 | ·±0.2% |
Response time響應(yīng)時(shí)間 | Gas characteristics：1～4sec 氣特性 Electrical characteristics:10sec 電特性 |
Working pressure difference range工作壓差范圍 | 0.1～0.5MPa |
Max. pressure**壓力 | 3MPa |
Connection 連接頭類(lèi)型 | Φ6mmDouble clasp stainless steel joint Φ6mm雙卡套不銹鋼接頭 |
Vacuum unit真空系統(tǒng) | |
KF25 series bellows and manual stopper valves | 采用KF25系列波紋管和手動(dòng)擋板閥 |
Vacuum up to10-1Pa | 真空度可達(dá)10-1Pa |
The value can be displayed intuitively by the digital display vacuum tester | 數(shù)顯真空測(cè)試儀可直觀的顯示數(shù)值 |
